List of Publications and Presentation

Under the guiding principle of "Contributing to the society through advanced technologies", we have continuously continued technological development since our foundation. We publish the results of pursuing "ultra cutting edge science and technology", such as the development of new analytical techniques, devising pretreatment techniques, and application and development to various device fields, at academic conferences and papers.

• Depth-dependent structural evolution in IGZO thin films revealed by soft X-ray XAFS

  ●Masahiro Kunisu, Keiichi Yamada, Shino Kosaka, Takashi Yamamoto

  11th International Congress on Ceramics (ICC '11) (Sapporo)

• In-Situ TEM Analysis of Thermally Induced Phase and Microstructural Evolution in Functional Ceramic Materials

  Kosuke Kimura

  11th International Congress on Ceramics (ICC '11) (Sapporo)

• Surface Analysis of GaN After Ar Ion Irradiation

  ●Takahiko Ikarashi, Asami Yasui, Chizuru Asahara, Sara Mizuno, Haruka Hidaka, Shinya Yazaki, Hideaki Mizusaki and Tomohiro Sakata

  EUROPEAN CONFERENCE ON APPLICATIONS OF SURFACE AND INTERFACE ANALYSIS (ECASIA2026) (Brussels, BELGIUM)

• Advanced SIMS approaches for spatially resolved dopant and impurity analysis in SiC power devices

  ●Seishi Akahori, Yoshihiko Nakata, Junichiro Sameshima

  25th International Conference on Ion Implantation and Annealing Technology 2026 (IIT2026) (Villach, Austria)

• Low-Temperature Cathodoluminescence Characterization of Residual Defects in High-Dose Al-Implanted 4H-SiC

  ●Tomoyuki Uchida, Shinya Honda, Ryuichi Sugie¹ (1:Ritsumeikan Univ.)

  ICSCRM2026 (Yokohama)

• Interfacial Characterization of Fine-Pitch Cu/Polyimide L/S Structures for RDL Improvement Using AFM-IR and TEM-EELS

  ●Masahiro Saito, Hirofumi Seki, Tatsuhiro Nagasaka, Naohiko Kawasaki, Ai Hashimoto, Hideki Hashimoto, Chin-Hung Wang¹, Wei-Chung Lo¹
  (1:Industrial Technology Research Institute)

  59th International Microelectronics Assembly and Packaging Society (IMAPS 2026) (Boston, USA)

• Interfacial structural modification in Cu/low-k interconnects revealed by atomic force microscopy infrared spectroscopy

  Tatsuhiro Nagasaka, Hirofumi Seki, Tadao Tanabe¹ (1: Shibaura Ins. Tec. Univ.)

  J. Appl. Phys. 140, 055304 (2026).

  https://doi.org/10.1063/5.0344213

• Impact of Carbazole-Adduct Species on OLED Performance and Degradation Behavior

  ●H. Takano, C. Inoue, T. Shibamori, H. Fujimoto^1,2, C. Adachi^1,2
  (1:i³-opera, 2:Center for Organic Photonics and Electronics Research)

  IMID 2026 (Busan, Korea)

• Effect of Ar Ion Etching on GaN Surfaces in Surface Analysis

  ●Takahiko Ikarashi, Asami Yasui, Chizuru Asahara, Sara Mizuno, Haruka Hidaka, Shinya Yazaki¹, Hideaki Mizusaki¹ and Tomohiro Sakata
  (1:Nagano Prefecture General Industrial Technology Center)

  International Symposium on Sputtering & Plasma Processes (ISSP2026) (Kyoto)

• Rapid Structural Elucidation of Thermally Degraded α-NPD in OLED Films by Cyclic Ion Mobility Mass Spectrometry

  ● X. Li, F. Kato, H. Takano, H. Fujimoto¹, S. Kitagawa²
  (1:Fukuoka Industry, Science & Technology Foundation, 2:Nagoya Institute of Technology)

  74th ASMS(American Society for Mass Spectrometry) Conference (San Diego, USA)

• Revealing the Structural Origins of Ionic Conductivity Degradation in Li₆PS₅Cl: A Detailed Spectroscopic Study of Moisture-Induced Chemical and Crystallographic Transformations

  ●Yasuhito Aoki, Hironobu Tsuji, Asami Shibamori, Riko Miyoshi, Kazuo Kimura, Tomohiro Ito, Kengo Ogawa

  ACS Appl. Energy Mater. 2026, 9, 12, 7794–7802

  https://doi.org/10.1021/acsaem.6c01042

• A Novel Interface Characterization Technique for Hybrid Bonding Process Optimization

  ●Masahiro Saito, Tomohiro Sakata, Tetsuro Ota, Jumpei Yahiro, and Ryu Suzuki

  Conference of Science & Technology for Integrated Circuits (CSTIC)2026 (Shanghai)

• Infrared Ion Spectroscopy-Based Identification of a Trace Impurity in Organic Light-Emitting Diode Materials Without Fully Matched Reference Standards

  Hikaru Takano, Daniël Visser¹, Lara van Tetering^1,2, Teun van Wieringen^1,2, Giel Berden^1,2, Jos Oomens^1,2, Daichi Shirakura, Hiroshi Fujimoto^3,4, Chihaya Adachi^3,4, Keiko Matsuda
  (1:HFML-FELIX, 2:Radboud University, 3:i³-opera, 4:Kyushu University)

  Analytical Chemistry, 2026, 98(10), 7603-7612.

  https://doi.org/10.1021/acs.analchem.5c07556

• Charge suppression in SEM imaging using pulsed electron beam modulation from an NEA-InGaN semiconductor photocathode

  ●M. Yasuda, T. Nishitani¹, Y. Arakawa¹, D. Sato¹, K. Niimi¹, A. Koizumi¹, Y. Otsuka (1:Photo electron Soul)

  SPIE Metrology, Inspection, and Process Control XL (San Jose USA)