GCIB-TOF-SIMS, TOF-SIMS

Technical Documents

GCIB-TOF-SIMS, TOF-SIMS

GCIB-TOF-SIMS, TOF-SIMS depth profiling with gas cluster ion beam (GCIB), enables depth profiling of organics with low damage.
We can provide the information of composition and depth distribution of organics, and interface of multilayer for the purpose of degradation analysis, process evaluation, etc.
This technique is applicable to various fields of organic samples, such as OLED, polymer, photoresist, SEI on battery electrode.